5^th Annual Minnesota Nanotechnology Conference
November 17 - 18, 2009

University of Minnesota campus
Radisson University Hotel
615 Washington Ave SE
Minneapolis, MN 55414

NEW THIS YEAR!
Schedule of Events
Map, directions, and parking

This year's event offers presentations and discussions on topics including Materials, Magnetic Structures & Devices, Spintronics, Novel Techniques in Characterization, and Organic Photovoltaics.  We will also include a reception and poster session after Tuesday's talks.  The reception will be a wonderful opportunity to network, enjoy refreshments and view the poster exhibit while talking one-on-one with researchers about their work.

Registration is required to attend this conference.  As of November 11, online registration is closed.  If you wish to attend, please contact Becky von Dissen directly at 612-625-3069 or .

NEW THIS YEAR!

The Nanofabrication Center is offering three special short courses on device fabrication during the 2009 Nanotechnology Conference.  Expand your skills and learn how nanofabrication techniques can improve your product.  Classes offered are:

Microfabrication for Beginners: 9:30am - 12:00pm, November 17   *FULL*
Microfabrication for Beginners: 9:30am - 12:00pm, November 18   *FULL*

Review of principles & processes of thin film deposition, optical lithography, and device fabrication, and discussion of potential applications to products in a wide range of fields.  Fabrication of a simple structure on a thin film layer, pattern a photoresist layer using optical lithography and etching.  An overview of deposition and etching will also be included to underline the link between lithography and pattern transfer.

Electron Beam Lithography: 2:00pm - 4:30pm, November 17   *FULL*

The EBL system is a key tool to fabricate structures on the nanoscale, i.e., with feature sizes smaller than 100nm.  In this course, we will learn the operation of the EBL system, demonstrate its capabilities to produce true nanostructures, and explore potential applications.

Using the Focused Ion Beam: 2:00pm - 4:30pm, November 18   *FULL*

The FIB uses a beam of gallium ions to etch, cut, and sculpt structures as small as 30 nm in silicon and other substrates.  It can also be used to prepare very thin samples for TEM analysis.  This course will cover the basics of FIB operation including sample loading, eucentric positioning, ion beam etching, Pt deposition, and the use of an Omniprobe micromanipulator.